홈페이지의 새로운 패러다임

지속적인 연구개발을 통한 제품개발과 품질향상에 노력하고 있습니다.

journal

journal
patent
conference
 

PUBLICATION  Conference

conference

 

 

[IDW 2018] A Study on DegradationMechanism of Flexible a-InGaZnO Thin Film Transistor Under Repetitive BendingStress Using SimulationKi-Lim Han, Hyun-Jun Jeong,Beom-Su Kim, Saeroonter Oh and Jin-Seong..
[카테고리 : 2018]
[IDW 2018] Near-Infrared Thin FilmPhototransistor with Energy Band-Tunable Zinc Oxynitride SemiconductorHyun-Mo Lee, Hyun-Jun Jeong, Eun-Jae Park, You Seung Rim* and Jin-SeongPark*
[카테고리 : 2018]
[China ALD 2018] Recent Progresses of Atomic Layer Deposited Oxide Semiconductors and Their Device Applications, Invited speaker, Jin-Seong ParkJung-Hoon Lee, JiazhenSheng, Tae-Hyun Hong, Wan-Ho Choi,..
[카테고리 : 2018]
[China ALD 2018] RobustnessEnhancement of Adhesive Layer during Flexible Thin Film Transistor Fabricationby Atomic Layer Deposited Al2O3 Buffer LayerJiazhen Sheng, TaeHyun Hong, Young Bae Kim, Tae Hee..
[카테고리 : 2018]
[China ALD 2018] Chemical Stable,Defect Suppression of Amorphous Sn-doped Indium Zinc Oxide (IZTO) SemiconductorMaterials for Thin Film Transistor without Etch-stop LayerJiazhen Sheng, Tae Hyun Hong,J..
[카테고리 : 2018]
[China ALD 2018] Chemical Stable,Defect Suppression of Amorphous Sn-doped Indium Zinc Oxide (IZTO) SemiconductorMaterials for Thin Film Transistor without Etch-stop LayerJiazhen Sheng, Tae Hyun Hong,J..
[카테고리 : 2018]
[IMID 2018] The Improvement ofElectrical Performance of ZnON TFTs using Ultra-Fast Intensive Pulse Light(IPL) Process under Room TemperatureHyun-Jun Jeong, Hyun-Mo Lee,Ki-Lim Han, Eun-Jae Park, Ji-Eun..
[카테고리 : 2018]
[IMID 2018] Enhancing Mechanical andElectrical Performance of Flexible Amorphous InGaZnO Thin-Film TransistorsUsing Organic/Inorganic Hybrid Buffer LayerKi-Lim Han, Hyun-Jun Jeong, Beom-Su Kim, Seong ..
[카테고리 : 2018]
[IMID 2018]Near-Infrared Photoresponsivityof ZnON Thin-Film Transistor with Energy Band-Tunable SemiconductorHyun-Mo Lee, Hyun-Jun Jeong, Eun-Jae Park, You Seung Rim andJin-Seong Park
[카테고리 : 2018]
[ALD/ALE 2018] Low temperature plasmaenhanced atomic layer deposition of SiOx films using divalent Si precursor forthin film encapsulationjung-Hoon Lee, Seung-Hwan Lee, Ju-Hwan HanWan-ho Choi, andJin-..
[카테고리 : 2018]
  1   2   3   4   5   6   7   8