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15. [ACS Applied Materials & Interfaces] Boosting Responsivity of Organic−Metal Oxynitride Hybrid Heterointerface Phototransistor You Seung Rim, Kyung-Chul Ok, Yang Michael Yang, Huajun Chen, Sa..
[조회수 : 602, 카테고리 : 2016, No : 137]
14. [Ceramics International] Enhancing thethermoelectric properties of super-lattice Al2O3/ZnO atomic film via interface confinement Jung-Hoon Lee , Tae-HyunPark , Seung-HwanLee , No-WonPark , Won-Yon..
[조회수 : 627, 카테고리 : 2016, No : 136]
13. [J Electroceram] Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma Ha-Jin Lee & Jin-Seong Park & Se-Hu..
[조회수 : 653, 카테고리 : 2016, No : 135]
12. [J. Phys. D: Appl. Phys] Electrical stability enhancement of GeInGaO thin-film transistors by solution-processed Li-doped yttrium oxide passivation U H Choi, S Yoon, D H Yoon, Y J Tak, Y-G Kim, B ..
[조회수 : 598, 카테고리 : 2016, No : 134]
11. [RSC Advances] Photoresponses of InSnGaO and InGaZnO thin-film transistors Seung Won Shin, Jae Eun Cho, Hyun-Mo Lee, Jin-Seong Park, Seong Jun Kang
[조회수 : 619, 카테고리 : 2016, No : 133]
10. [Applied Physics Letters] Anti-reflective conducting indium oxide layer on nanostructured substrate as a function of aspect ratio Hyun-Woo Park, Seungmuk Ji, Hyuneui Lim, Dong-won Choi, Jin-Seong ..
[조회수 : 596, 카테고리 : 2016, No : 132]
9. [J. Mater. Chem. C] Performance modulation of transparent ALD indium oxide films on flexible substrates: transition between metal-like conductor and high performance semiconductor statesJiazhen She..
[조회수 : 718, 카테고리 : 2016, No : 131]
8. [ACS Appl. Mater. Interfaces 2016] A Study on the Growth Behavior and Stability of Molecular LayerDeposited Alucone Films Using Diethylene Glycol and TrimethylAluminum Precursors, and the Enhanceme..
[조회수 : 680, 카테고리 : 2016, No : 130]
7. [Applied Surface Science] Atomic layer deposition of indium oxide thin film from a liquid indiumcomplex containing 1-dimethylamino-2-methyl-2-propoxy ligandsJeong Hwan Han, Eun Ae Jung, Hyo Yeon Ki..
[조회수 : 659, 카테고리 : 2016, No : 129]
6. [JECR] Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma Ha-Jin Lee, Jin-seong Park, Se-Hun Kwon
[조회수 : 641, 카테고리 : 2016, No : 128]
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