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19. [ACS Applied Materials & Interfaces] Flexible and High-Performance Amorphous Indium Zinc Oxide Thin Film Transistor Using Low-Temperature Atomic Layer Deposition Jiazhen Sheng, Hwan-Jae Lee, Saero..
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[조회수 : 438, 카테고리 : 2016, No : 154]
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13.[ACS Applied Materials & Interfaces] Atomic Layer Deposition of Indium Gallium Oxide Thin Film for Thin Film Transistor Applications Jiazhen Sheng, Eun Jung Park, Bonggeun Shong, and Jin-Seong Park
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[조회수 : 400, 카테고리 : 2017, No : 153]
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12. [ J. Vac. Sci. Technol. A ] Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applicationsYoung-Soo Lee, Ju-Hwan Han, and Jin-Seong Pa..
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[조회수 : 340, 카테고리 : 2017, No : 152]
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11. [ACS Applied Materials & Interfaces] High-Performance Zinc Tin Oxide Semiconductor Grown by Atmospheric-Pressure Mist-CVD and the Associated Thin-Film Transistor Properties Jozeph Park, Keun-Tae O..
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10. [SCIENTIFIC REPORTS] The resonant interaction between anions or vacancies in ZnON semiconductors and their effects on thin film device properties Jozeph Park, Hyun-Jun Jeong, Hyun-Mo Lee, Ho-Hyun ..
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9. [Ceramics International] Silicon oxide film deposited at room temperatures using high-workingpressure plasma-enhanced chemical vapor deposition: Effect of O2 flow rate Young-Soo L..
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8. [Ceramics International] Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition Seung-Hwan Lee, Jung-Dae Kwon, Ji-Hoon Ahn, J..
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7. [Ceramics International] Facile synthesis of AlOx dielectrics via mist-CVD based on aqueous solutions Keun-Tae Oh, Hyo-yeon Kim, Dong-hyun Kim, Jeong Hwan Han, Jozeph Park, Jin-Seong Park
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6. [Nanoscale] Control of phonon transport by the formation of the Al2O3 interlayer in Al2O3–ZnO superlattice thin films and their in-plane thermoelectric energy generator performanceNo-Wo..
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