23. [Ceramics intermational] Atomic layerdepositedp-typecopperoxidethin films andtheassociated Wanjoo Maeng, Seung-HwanLee, Jung-DaeKwon, JozephPark, Jin-SeongPark
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[Á¶È¸¼ö : 1431, Ä«Å×°í¸® : 2015, No : 122]
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22. [Applied Surface Science]Growth of tantalum nitride film as a Cu diffusion barrier byplasma-enhanced atomic layer deposition frombis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)ta..
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[Á¶È¸¼ö : 1611, Ä«Å×°í¸® : 2015, No : 121]
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21. [Applied Surface Science]Hyun-Woo Park, Seungmuk Ji, Diptya Suci Herdini, Hyuneui Limb, Jin-Seong Park, Kwun-Bum ChungAntireflective conducting nanostructures with an atomic layerdeposited an AlZn..
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[Á¶È¸¼ö : 1523, Ä«Å×°í¸® : 2015, No : 120]
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20. [Applied Surface Science]Byung Du Ahn, Kwang Ho Lee, Jozeph Park, Jin-Seong ParkThe effect of nitrogen incorporation in Ge–In–Ga–O semiconductorand the associated thin film trans..
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[Á¶È¸¼ö : 1490, Ä«Å×°í¸® : 2015, No : 119]
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19. [IEEE ELECTRON DEVICE LETTERS]Hyun-Jun Jeong, Kyung-Chul Ok, Jozeph Park, Junhyung Lim, Johann Cho, and Jin-Seong ParkStability Improvement of In–Sn–Ga–O Thin-Film Transistors at..
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[Á¶È¸¼ö : 1689, Ä«Å×°í¸® : 2015, No : 118]
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18. [ACS Appl. Mater. Interfaces]Seung Won Shin, Kwang-Ho Lee, Jin-Seong Park, and Seong Jun KangHighly Transparent, Visible-Light Photodetector Based on Oxide Semiconductors and Quantum Dots
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[Á¶È¸¼ö : 1458, Ä«Å×°í¸® : 2015, No : 117]
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17. [IEEE ELECTRON DEVICE LETTERS]Kyung-Chul Ok, Saeroonter Oh, Member, Hyun-Jun Jeong, Jong Uk Bae, and Jin-Seong ParkEffect of Alumina Buffers on the Stability of Top-Gate Amorphous InGaZnO Thin-Fil..
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[Á¶È¸¼ö : 1642, Ä«Å×°í¸® : 2015, No : 116]
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16. [Ceramics International]Kyung-Chul Ok, Hyun-Jun Jeong, Hyun-Mo Lee, Jozeph Park, Jin-Seong ParkComparative studies on the physical and electronic properties of reactively sputtered ZnO and ZnON se..
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[Á¶È¸¼ö : 1535, Ä«Å×°í¸® : 2015, No : 115]
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15. [Ceramics International]W.J. Maeng, Dong-won Choi, Jozeph Park, Jin-Seong ParkAtomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant
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[Á¶È¸¼ö : 1502, Ä«Å×°í¸® : 2015, No : 114]
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14. [Journal of Nanomaterials]Young Jun Yun, MihyeWu, Jin Kyu Kim, Ji Young Ju, Sun Sook Lee, Ki Woong Kim, Woon Ik Park, Ha-Kyun Jung, Kwang Ho Kim, Jin-Seong Park, and Sungho ChoiMorphology Effect o..
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[Á¶È¸¼ö : 1550, Ä«Å×°í¸® : 2015, No : 113]
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