[J Electroceram] W. J. Maeng & Jin-Seong Park, Growth characteristics and film properties of gallium doped zinc oxide prepared by atomic layer deposition
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[J Electroceram] Woo-Chang Choi et al, Multifunctional Ru-AlN heating resistor films for high efficiency inkjet printhead
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[J Electroceram] Hyun-Suk Kim & Jin-Seong Park, The performance and negative bias illumination stabilityof Hf-In-Zn-O thin film transistors on sputtering conditions
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[Á¶È¸¼ö : 1772, Ä«Å×°í¸® : 2013, No : 66]
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[Applied Physics Letters ] Kyung-Chul Ok et al, The effect of Ta doping in polycrystalline TiOx and the associated thin film transistor properties
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[J Electroceram] Jin-Seong Park & H. Kim & Il-Doo Kim, "Overview of electroceramic materials for oxide semiconductor thin film transistors"
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[Applied Surface Science] Jung-Dae Kwon et al. "Controlled growth and properties of p-type cuprous oxide films byplasma-enhanced atomic layer deposition at low temperature"
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[Á¶È¸¼ö : 1910, Ä«Å×°í¸® : 2013, No : 63]
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[Materials Chemistry and Physics] Dong-won Choi et al,"Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum"
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[Á¶È¸¼ö : 1820, Ä«Å×°í¸® : 2013, No : 61]
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[Journal of Physics D: Applied Physics] Kyung-Chul Ok et al, The effect of Nb doping on the performance and stability of TiOx devices
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[Thin Solid Films] Dong-won Choi et al, Gas diffusion barrier characteristics of Al2O3/alucone films formed using trimethylaluminum, water and ethylene glycol for organic light emitting diode encapsul..
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[Á¶È¸¼ö : 1965, Ä«Å×°í¸® : 2013, No : 59]
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[Thin Solid Films] D. Choi et al, "Low Temperature Ga2O3 atomic layer deposition using gallium tri-isopropoxide and water"
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[Á¶È¸¼ö : 1948, Ä«Å×°í¸® : 2013, No : 58]
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