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Á¶È¸¼ö 359
Ä«Å×°í¸® 2020
No 223
Á¦¸ñ 12. [Journal of the Korean Physical Society] Improved Long-Term Stability of Low-Temperature Polysilicon Thin-Film Transistors by Using a Tandem Gate Insulator with an Atomic Layer of Deposited Silicon Dioxide

12. [Journal of the Korean Physical Society] Improved Long-Term Stability of Low-Temperature Polysilicon Thin-Film Transistors by Using a Tandem Gate Insulator with an Atomic Layer of Deposited Silicon Dioxide




Sungsoo Lee, Jin-Seong Park & Yongtaek Hong

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Lee2020_Article_ImprovedLong-TermStabilityOfLo.pdf