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Á¶È¸¼ö 336
Ä«Å×°í¸® 2020
No 216
Á¦¸ñ 11. [Journal of Materials Chemistry C] Nanoscale surface engineering of a high-k ZrO2/SiO2 gate insulator for high performance ITZO TFT via plasma-enhanced atomic layer deposition

11. [Journal of Materials Chemistry C] Nanoscale surface engineering of a high-k ZrO2/SiO2 gate insulator for high performance ITZO TFT via plasma-enhanced atomic layer deposition



Wan-Ho Choi, Woojin Jeon and Jin-Seong Park


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20200819 revised manuscript JMCC_clean.pdf