11. [Journal of Materials Chemistry C] Nanoscale surface engineering of a high-k ZrO2/SiO2 gate insulator for high performance ITZO TFT via plasma-enhanced atomic layer deposition
11. [Journal of Materials Chemistry C] Nanoscale surface engineering of a high-k ZrO2/SiO2 gate insulator for high performance ITZO TFT via plasma-enhanced atomic layer deposition