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조회수 1081
카테고리 2015
No 121
제목 22. [Applied Surface Science] Growth of tantalum nitride film as a Cu diffusion barrier byplasma-enhanced atomic layer deposition frombis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
22. [Applied Surface Science]

Growth of tantalum nitride film as a Cu diffusion barrier byplasma-enhanced atomic layer deposition frombis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex


Jeong Hwan Han, Hyo Yeon Kim, Sang Chan Lee, Da Hye Kim, Bo Keun Park, Jin-Seong Park, Dong Ju Jeon, Taek-Mo Chung, Chang Gyoun Kim


첨부파일
APSC_2015_TaN-published.pdf