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Á¦¸ñ CSTIC ±¹Á¦ ÇÐȸ Âü¼® ¹× Oral presentation
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ÀÛ¼ºÀÏÀÚ 2016-03-22
 

 
Áß±¹ »óÇÏÀÌ¿¡¼­ 2016 CSTIC(China Semiconductor Technology International
 
Conference) ÇÐȸ°¡ °³ÃÖ µÇ¾ú½À´Ï´Ù. (2016.3.13-14)
 
 
Shanghai International Convention Center No.2727 Riverside Avenue Pudong, Shanghai
 
200120, China

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The Effect of N2O Plasma Treatment on Indium Oxide Thin Film Transistor by Low
 
Temperature Atomic Layer Deposition ´ëÇÏ¿© ¹ßÇ¥ÇÏ¿´½À´Ï´Ù.

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